1st International Conference on ALD Applications & 2nd China ALD conference
Edited by:
Prof Shi-Jin Ding, Prof YOngfeng Mei
Atomic Layer Deposition is applied in numerous advanced technologies including microelectronics, nanotechnology, MEMS/NEMS, and green energy technology that require precise control of film properties in thickness, uniformity, and comformality etc. In microelectronics, ALD has established its applications in e.g. high dielectric constant (high-k) films for MOS devices, metal nanocrystals for memory devices, and ultrathin diffusion barriers for Cu interconnects. ALD is also receiving great attention for its potential application in solar energy, organic electronics, catalysis, micro-systems and biological applications. A unique attribute of ALD is the use of sequential self-limiting surface reactions to achieve conformal films with sub-monolayer thickness control.
Collection published: 15 February 2013
Last updated: 12 April 2013
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Atom-to-atom interactions for atomic layer deposition of trimethylaluminum on Ga-rich GaAs(001)-4 × 6 and As-rich GaAs(001)-2 × 4 surfaces: a synchrotron radiation photoemission study
Tun-Wen Pi, Hsiao-Yu Lin, Ya-Ting Liu, Tsung-Da Lin, Gunther K Wertheim, Jueinai Kwo, Minghwei Hong Nanoscale Research Letters 2013, 8:169 (12 April 2013)
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Electrical and optical properties of Al-doped ZnO and ZnAl2O4 films prepared by atomic layer deposition
Qiongqiong Hou, Fanjie Meng, Jiaming Sun Nanoscale Research Letters 2013, 8:144 (28 March 2013)
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Modulation in current density of metal/n-SiC contact by inserting Al2O3 interfacial layer
Shan Zheng, Qing-Qing Sun, Wen Yang, Peng Zhou, Hong-Liang Lu, David Wei Zhang Nanoscale Research Letters 2013, 8:116 (2 March 2013)
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Passivation mechanism of thermal atomic layer-deposited Al2O3 films on silicon at different annealing temperatures
Yan Zhao, Chunlan Zhou, Xiang Zhang, Peng Zhang, Yanan Dou, Wenjing Wang, Xingzhong Cao, Baoyi Wang, Yehua Tang, Su Zhou Nanoscale Research Letters 2013, 8:114 (2 March 2013)
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Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition
Zhi-Yuan Ye, Hong-Liang Lu, Yang Geng, Yu-Zhu Gu, Zhang-Yi Xie, Yuan Zhang, Qing-Qing Sun, Shi-Jin Ding, David Wei Zhang Nanoscale Research Letters 2013, 8:108 (27 February 2013)
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Optical and microstructural properties of ZnO/TiO2 nanolaminates prepared by atomic layer deposition
Yu-Zhu Gu, Hong-Liang Lu, Yang Geng, Zhi-Yuan Ye, Yuan Zhang, Qing-Qing Sun, Shi-Jin Ding, David Wei Zhang Nanoscale Research Letters 2013, 8:107 (27 February 2013)
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Enhanced band-edge photoluminescence from ZnO-passivated ZnO nanoflowers by atomic layer deposition
Zhi Wei Ai, Yun Wu, Hao Wu, Ti Wang, Chao Chen, Yang Xu, Chang Liu Nanoscale Research Letters 2013, 8:105 (25 February 2013)
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Blue light emission from the heterostructured ZnO/InGaN/GaN
Ti Wang, Hao Wu, Zheng Wang, Chao Chen, Chang Liu Nanoscale Research Letters 2013, 8:99 (22 February 2013)
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High-performance bilayer flexible resistive random access memory based on low-temperature thermal atomic layer deposition
Run-Chen Fang, Qing-Qing Sun, Peng Zhou, Wen Yang, Peng-Fei Wang, David Wei Zhang Nanoscale Research Letters 2013, 8:92 (19 February 2013)
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Effect of concurrent joule heat and charge trapping on RESET for NbAlO fabricated by atomic layer deposition
Peng Zhou, Li Ye, Qing Qing Sun, Peng Fei Wang, An Quan Jiang, Shi Jin Ding, David Wei Zhang Nanoscale Research Letters 2013, 8:91 (19 February 2013)
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Atomic layer deposition of high-density Pt nanodots on Al2O3 film using (MeCp)Pt(Me)3 and O2 precursors for nonvolatile memory applications
Shi-Jin Ding, Hong-Bing Chen, Xing-Mei Cui, Sun Chen, Qing-Qing Sun, Peng Zhou, Hong-Liang Lu, David Wei Zhang, Chen Shen Nanoscale Research Letters 2013, 8:80 (15 February 2013)
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Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
Riyanto Edy, Xiaojiang Huang, Ying Guo, Jing Zhang, Jianjun Shi Nanoscale Research Letters 2013, 8:79 (15 February 2013)
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Performance improvement of phase-change memory cell using AlSb3Te and atomic layer deposition TiO2 buffer layer
Sannian Song, Zhitang Song, Cheng Peng, Lina Gao, Yifeng Gu, Zhonghua Zhang, Yegang Lv, Dongning Yao, Liangcai Wu, Bo Liu Nanoscale Research Letters 2013, 8:77 (15 February 2013)
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