Effects of post-deposition annealing ambient on band alignment of RF magnetron-sputtered Y2O3 film on gallium nitride
Nanoscale Research Letters 2013, 8:53 doi:10.1186/1556-276X-8-53
This article is currently available as a provisional PDF. Reprints are produced from the final PDF, which is normally produced within 3 weeks.
Please complete the following form to register your interest in ordering reprints of this article. SpringerOpen will contact you by email when the final PDF is available with details of how to obtain a quotation and place an order.
Fields marked * are required