Figure 1.

SEM cross-sectional images of Fe3O4 thin films grown on a SiO2/Si substrate at 300°C using PLD. (a) 100 nm, (b) 300 nm, and (c) 400 nm. The insets show the AFM images of each thin film. (d) A summary of the prepared Fe3O4 thin film, including rms roughness, film thickness, deposition time, and grain size information.

Park et al. Nanoscale Research Letters 2014 9:96   doi:10.1186/1556-276X-9-96
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