FESEM images of CdS films grown on Ni-covered Si(100). At the substrate temperatures of (a) 400°C and (b) 450°C. The samples were prepared under the same laser pulse energy of 50 mJ. The deposition time, pulse energy, and frequency of catalyst-Ni were 15 min, 50 mJ, and 5Hz, respectively.
Li et al. Nanoscale Research Letters 2014 9:91 doi:10.1186/1556-276X-9-91