Figure 2.

Tilted FESEM images of the Si nanostructures etched by various flow rates of mixture gas. (a) 0.5 sccm. (b) 2.5 sccm. (c) 5.0 sccm. Inset: magnified FESEM images of the aggregate of nanoparticles.

Ha et al. Nanoscale Research Letters 2014 9:9   doi:10.1186/1556-276X-9-9
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