Figure 1.

Schematics of the fabrication process for the Si nanostructures. (a, b) The Si sheets were etched using hydrogen and argon mixture gases under 1 × 10−2 Torr at different high temperatures. (c) The Si-based polymer (PDMS) deposition on the Si nanostructures for enhancing the AR property.

Ha et al. Nanoscale Research Letters 2014 9:9   doi:10.1186/1556-276X-9-9
Download authors' original image