Figure 7.

Incident angle-dependent average reflectance and photographs of bulk Si and Si nanostructures. (a) Average reflectance as a function of incident angle for s- and p-polarized light and (b) photographs of bulk Si (left) and Si nanostructures (right) fabricated using the optimum fabrication conditions.

Kim et al. Nanoscale Research Letters 2014 9:54   doi:10.1186/1556-276X-9-54
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