Figure 2.

Process steps to fabricate Si nanostructures and Ag ink ratio-dependent distribution of Ag nanoparticles. (a) Fabrication procedure for forming Si nanostructures using spin-coated Ag ink nanoparticles and subsequent ICP etching. (b) Top-view SEM images of the randomly distributed Ag nanoparticles on Si substrate. The corresponding Ag ink ratios used are shown in the inset.

Kim et al. Nanoscale Research Letters 2014 9:54   doi:10.1186/1556-276X-9-54
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