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Open Access Nano Express

Released micromachined beams utilizing laterally uniform porosity porous silicon

Xiao Sun12*, Adrian Keating1 and Giacinta Parish2

Author Affiliations

1 School of Mechanical and Chemical Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia

2 School of Electrical, Electronic and Computer Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia

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Nanoscale Research Letters 2014, 9:426  doi:10.1186/1556-276X-9-426

Published: 22 August 2014

Abstract

Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repeated photolithography, lift off and electropolishing processes were used to release patterned porous silicon microbeams on a Si substrate. This is the first time that micromachined, suspended PS microbeams have been demonstrated with laterally uniform porosity, well-defined anchors and flat surfaces.

PACS

81.16.-c; 81.16.Nd; 81.16.Rf

Keywords:
Porous silicon; Photolithography; Microbeams; Release