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Open Access Nano Express

Controlling the Er content of porous silicon using the doping current intensity

Guido Mula1*, Lucy Loddo1, Elisa Pinna1, Maria V Tiddia1, Michele Mascia2, Simonetta Palmas2, Roberta Ruffilli3 and Andrea Falqui4

Author Affiliations

1 Dipartimento di Fisica, Cittadella Universitaria di Monserrato, Università degli Studi di Cagliari, S.P. 8 km 0.7, Monserrato, Cagliari 09042, Italy

2 Dipartimento di Ingegneria Meccanica Chimica e dei Materiali, Università degli Studi di Cagliari, Piazza d’Armi, Cagliari 09123, Italy

3 Nanochemistry, Istituto Italiano di Tecnologia, Via Morego 30, Genova 16163, Italy

4 Biological and Environmental Sciences and Engineering Division (BESE), King Abdullah University of Science and Technology (KAUST), Thuwal, Jeddah, Kingdom of Saudi Arabia

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Nanoscale Research Letters 2014, 9:332  doi:10.1186/1556-276X-9-332

Published: 4 July 2014

Abstract

The results of an investigation on the Er doping of porous silicon are presented. Electrochemical impedance spectroscopy, optical reflectivity, and spatially resolved energy dispersive spectroscopy (EDS) coupled to scanning electron microscopy measurements were used to investigate on the transient during the first stages of constant current Er doping. Depending on the applied current intensity, the voltage transient displays two very different behaviors, signature of two different chemical processes. The measurements show that, for equal transferred charge and identical porous silicon (PSi) layers, the applied current intensity also influences the final Er content. An interpretative model is proposed in order to describe the two distinct chemical processes. The results can be useful for a better control over the doping process.

PACS

81.05.Rm; 82.45.Rr

Keywords:
Porous Silicon; Er doping; Electrochemical impedance spectroscopy; Reflectivity; Scanning electron microscopy