Figure 2.

LSM images of an as-deposited and annealed Al films on Si substrate. (a) As-deposited film. Samples annealed at 550°C: (b) 3 h, (c) 6 h, (d and e) 9 h. (a to d) 40-nm-thick Al films and (e) 90-nm-thick Al film. Scale bars 20 μm.

Noh Nanoscale Research Letters 2014 9:312   doi:10.1186/1556-276X-9-312
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