Figure 3.

Typical XPS Si 2p spectrum of the nc-Si:H thin film underRH= 98.2%. The splitting of 0.6 eV is shown with all the intermediate oxidation states. The inset presents the surface oxygen content as a function of RH.

Wen et al. Nanoscale Research Letters 2014 9:303   doi:10.1186/1556-276X-9-303
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