Table 4

Thickness evolution of the thin films obtained LbL-E deposition technique after thermal treatment
Fabrication process Temperature Thickness (nm) LSPR (λmax; Amax)
[PAH(9.0)/PAA-AgNPs(9.0)]40 Ambient 642 ± 12 432.6 nm; 1.18
[PAH(9.0)/PAA-AgNPs(9.0)]40 50°C 611 ± 16 432.6 nm; 1.20
[PAH(9.0)/PAA-AgNPs(9.0)]40 100°C 600 ± 12 432.6 nm; 1.26
[PAH(9.0)/PAA-AgNPs(9.0)]40 150°C 552 ± 9 432.6 nm; 1.68
[PAH(9.0)/PAA-AgNPs(9.0)]40 200°C 452 ± 10 446.9 nm; 1.66

Thickness evolution of the LbL-E thin films and the location of the LSPR absorption bands (λmax) with their maxima absorbance values (Amax) as a function of the temperature.

Rivero et al.

Rivero et al. Nanoscale Research Letters 2014 9:301   doi:10.1186/1556-276X-9-301

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