Table 3

Thickness evolution of the thin films obtained LbL-E deposition technique
Fabrication process Thickness (nm) LSPR (λmax; Amax)
[PAH(9.0)/PAA-AgNPs(9.0)]10 63 ± 5 421.3 nm; 0.017
[PAH(9.0)/PAA-AgNPs(9.0)]20 165 ± 4 432.1 nm; 0.13
[PAH(9.0)/PAA-AgNPs(9.0)]30 507 ± 16 432.3 nm; 0.77
[PAH(9.0)/PAA-AgNPs(9.0)]40 642 ± 12 432.6 nm; 1.18

Thickness evolution of the LbL-E thin films and the location of the LSPR absorption bands (λmax) with their maxima absorbance values (Amax).

Rivero et al.

Rivero et al. Nanoscale Research Letters 2014 9:301   doi:10.1186/1556-276X-9-301

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