Table 2

Thickness evolution of the thin films obtained by ISS process after thermal treatment
Fabrication process Temperature Thickness (nm) LSPR (λmax; Amax)
[PAH(9.0)/PAA(9.0)]40+ 4 L/R cycle Ambient 294 ± 8 424.6 nm; 1.07
[PAH(9.0)/PAA(9.0)]40+ 4 L/R cycles 50°C 277 ± 9 424.6 nm; 1.10
[PAH(9.0)/PAA(9.0)]40+ 4 L/R cycles 100°C 256 ± 7 424.6 nm; 1.16
[PAH(9.0)/PAA(9.0)]40+ 4 L/R cycles 150°C 212 ± 7 436.8 nm; 1.63
[PAH(9.0)/PAA(9.0)]40+ 4 L/R cycles 200°C 194 ± 7 477.1 nm; 1.57

Thickness evolution of the ISS thin films and the location of the LSPR absorption bands (λmax) with their maxima absorbance values (Amax) as a function of the temperature.

Rivero et al.

Rivero et al. Nanoscale Research Letters 2014 9:301   doi:10.1186/1556-276X-9-301

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