Table 1

Thickness evolution of the thin films obtained by ISS process
Fabrication process Thickness (nm) LSPR (λmax; Amax)
[PAH(9.0)/PAA(9.0)]40 288 ± 5 -
[PAH(9.0)/PAA(9.0)]40 + 1 L/R cycle 291 ± 4 421.3 nm; 0.04
[PAH(9.0)/PAA(9.0)]40 + 2 L/R cycles 289 ± 16 422.1 nm; 0.09
[PAH(9.0)/PAA(9.0)]40 + 3 L/R cycles 296 ± 8 422.8 nm; 0.79
[PAH(9.0)/PAA(9.0)]40 + 4 L/R cycles 294 ± 8 424.6 nm; 1.07

Thickness evolution of the ISS films and the location of the LSPR absorption bands (λmax) with their maxima absorbance values (Amax).

Rivero et al.

Rivero et al. Nanoscale Research Letters 2014 9:301   doi:10.1186/1556-276X-9-301

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