Figure 10.

Cross-sectional TEM micrographs of the upper part of the thin film and AFM phase images. (a, b) Cross-sectional TEM micrograph of the upper part of the thin film and AFM surface phase image for the ISS process. (c, d) Cross-sectional TEM micrograph of the upper part of the thin film and AFM surface phase image for the LbL-E deposition technique.

Rivero et al. Nanoscale Research Letters 2014 9:301   doi:10.1186/1556-276X-9-301
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