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Structural and optical characterizations of InPBi thin films grown by molecular beam epitaxy

Yi Gu1, Kai Wang1, Haifei Zhou1, Yaoyao Li1, Chunfang Cao1, Liyao Zhang1, Yonggang Zhang1, Qian Gong1* and Shumin Wang12*

Author Affiliations

1 State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China

2 Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg 41296, Sweden

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Nanoscale Research Letters 2014, 9:24  doi:10.1186/1556-276X-9-24

Published: 13 January 2014


InPBi thin films have been grown on InP by gas source molecular beam epitaxy. A maximum Bi composition of 2.4% is determined by Rutherford backscattering spectrometry. X-ray diffraction measurements show good structural quality for Bi composition up to 1.4% and a partially relaxed structure for higher Bi contents. The bandgap was measured by optical absorption, and the bandgap reduction caused by the Bi incorporation was estimated to be about 56 meV/Bi%. Strong and broad photoluminescence signals were observed at room temperature for samples with xBi < 2.4%. The PL peak position varies from 1.4 to 1.9 μm, far below the measured InPBi bandgap.

InPBi; HRXRD; Absorption; Photoluminescence; Molecular beam epitaxy