Microstructure and optical properties of nanocrystalline Cu2O thin films prepared by electrodeposition
1 School of Physics and Material Science, Anhui University, Hefei 230601, China
2 School of Mechanical and Electronic Engineering, Chuzhou University, Chuzhou 239000, China
Nanoscale Research Letters 2014, 9:219 doi:10.1186/1556-276X-9-219Published: 7 May 2014
Cuprous oxide (Cu2O) thin films were prepared by using electrodeposition technique at different applied potentials (−0.1, −0.3, −0.5, −0.7, and −0.9 V) and were annealed in vacuum at a temperature of 100°C for 1 h. Microstructure and optical properties of these films have been investigated by X-ray diffractometer (XRD), field-emission scanning electron microscope (SEM), UV-visible (vis) spectrophotometer, and fluorescence spectrophotometer. The morphology of these films varies obviously at different applied potentials. Analyses from these characterizations have confirmed that these films are composed of regular, well-faceted, polyhedral crystallites. UV–vis absorption spectra measurements have shown apparent shift in optical band gap from 1.69 to 2.03 eV as the applied potential becomes more cathodic. The emission of FL spectra at 603 nm may be assigned as the near band-edge emission.