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Optimum deposition conditions of ultrasmooth silver nanolayers

Tomasz Stefaniuk1*, Piotr Wróbel1, Ewa Górecka2 and Tomasz Szoplik1

Author Affiliations

1 Faculty of Physics, University of Warsaw, Pasteura 7, Warsaw 02-093, Poland

2 Department of Chemistry, University of Warsaw, Żwirki i Wigury 101, Warsaw 02-089, Poland

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Nanoscale Research Letters 2014, 9:153  doi:10.1186/1556-276X-9-153

Published: 31 March 2014

Additional files

Additional file 1:

Two-dimensional X-ray diffraction (XRD2) pattern of the crystalline 30-nm-thick Ag layer deposited at 295 K. The central bright spot comes from diffraction on Al2O3 single-crystal substrate and the weak arc from silver nanocrystallites with periodicity 3.88 Å and random orientation in space.

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Additional file 2:

SEM image of the 10-nm Ag film on 1-nm Ge interlayer deposited at RT on sapphire substrate. The 10-nm Ag film has the lowest, ever reported, surface roughness of RMS = 0.22 nm and ten-point height equal to 1.05 nm.

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