Figure 2.

Influence of confinement. Patterned 150-nm-thick SiOx film irradiated (a) without and (b) with confinement (after peeling off the confinement layer); laser parameters: 248 nm, 260 mJ/cm2, 1 pulse.

Ihlemann and Weichenhain-Schriever Nanoscale Research Letters 2014 9:102   doi:10.1186/1556-276X-9-102
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