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Pulsed laser-induced formation of silica nanogrids

Jürgen Ihlemann* and Ruth Weichenhain-Schriever

Author Affiliations

Laser-Laboratorium Göttingen, Hans-Adolf-Krebs-Weg 1, Göttingen 37077, Germany

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Nanoscale Research Letters 2014, 9:102  doi:10.1186/1556-276X-9-102

Published: 2 March 2014


Silica grids with micron to sub-micron mesh sizes and wire diameters of 50 nm are fabricated on fused silica substrates. They are formed by single-pulse structured excimer laser irradiation of a UV-absorbing silicon suboxide (SiOx) coating through the transparent substrate. A polydimethylsiloxane (PDMS) superstrate (cover layer) coated on top of the SiOx film prior to laser exposure serves as confinement for controlled laser-induced structure formation. At sufficiently high laser fluence, this process leads to grids consisting of a periodic loop network connected to the substrate at regular positions. By an additional high-temperature annealing, the residual SiOx is oxidized, and a pure SiO2 grid is obtained.


81.07.-b; 81.07.Gf; 81.65.Cf

Laser; Ablation; Silica; Silicon suboxide; Nanogrid; Confinement