Figure 4.

Bright-field image showing cross-sectional view of Al2O3/ZrO2(5:10 nm) multilayer film annealed at 1,273 K in HTXRD. Inset shows the SAED pattern.

Balakrishnan et al. Nanoscale Research Letters 2013 8:82   doi:10.1186/1556-276X-8-82
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