Figure 2.

HTXRD pattern of Al2O3/ZrO2film (5:5 nm) in the temperature range 300-1273 K. The peak at 60° (2θ) indicates reflection from the substrate holder.

Balakrishnan et al. Nanoscale Research Letters 2013 8:82   doi:10.1186/1556-276X-8-82
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