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Oxidative and carbonaceous patterning of Si surface in an organic media by scanning probe lithography

Matteo Lorenzoni1*, Andrea Giugni2 and Bruno Torre1

Author affiliations

1 Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163, Genova, Italy

2 Nanostructures, Istituto Italiano di Tecnologia, Via Morego 30, 16163, Genova, Italy

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Citation and License

Nanoscale Research Letters 2013, 8:75  doi:10.1186/1556-276X-8-75

Published: 13 February 2013


A simple top-down fabrication technique that involves scanning probe lithography on Si is presented. The writing procedure consists of a chemically selective patterning in mesitylene. Operating in an organic media is possible to perform local oxidation or solvent decomposition during the same pass by tuning the applied bias. The layer deposited with a positively biased tip with sub-100-nm lateral resolution consists of nanocrystalline graphite, as verified by Raman spectroscopy. The oxide pattern obtained in opposite polarization is later used as a mask for dry etching, showing a remarkable selectivity in SF6 plasma, to produce Si nanofeatured molds.

Scanning probe lithography; Nanocrystalline graphite; Dry etching mask