Figure 2.

XRD patterns obtained for BTO thin films. The films were deposited on a buffer layer with a thickness of 8.9 nm and a BTO seed layer of 30 nm (a) annealing after each 30-nm BTO layer deposition at different temperatures and (b) annealing at 700°C after each 30-nm BTO layer deposition or after four 30-nm BTO depositions (120 nm).

George et al. Nanoscale Research Letters 2013 8:62   doi:10.1186/1556-276X-8-62
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