Figure 2.

Cross-sectional SEM images of SiNW arrays. (a) As-prepared SiNW arrays with the length of approximately 5 μm. (b) SiNW arrays (1-μm length) covered with ITO. The inset is the corresponding high-magnification image.

Dong et al. Nanoscale Research Letters 2013 8:544   doi:10.1186/1556-276X-8-544
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