Figure 2.

Copper composition in dealloyed NiCu thin films. Copper composition in the dealloyed films as a function of the composition in the as-deposited film. Each point represents a single sample, and the error bars are the typical EDS uncertainty. The dashed line indicates removal of both components at equal rates.

Koboski et al. Nanoscale Research Letters 2013 8:528   doi:10.1186/1556-276X-8-528
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