Figure 1.

Copper composition in electrodeposited NiCu thin films. Copper composition in the electrodeposited films as determined by EDS as a function of the copper composition in the deposition solution. Each point represents a single sample, and the error bars are the typical EDS uncertainty. The dashed line indicates equal composition in the solution and in the film.

Koboski et al. Nanoscale Research Letters 2013 8:528   doi:10.1186/1556-276X-8-528
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