Schematic diagram showing the process of fabricating the sTNP tip. (a, b) Etching process for reflective metal layer on Olympus RC-800 Si3N4 tip. (c) The vertex of the tip was flattened by scanning the tip across a polished Si3N4 wafer. (d, e) Present SEM images of the Si3N4 AFM tip before and after the scanning process, respectively. (f) A small quantity of adhesive was applied to the flat top of the AFM tip. (g) Attached sTNP to the vertex of the flattened tip with adhesive followed by curing. (h) Schematic diagram of fabricated sTNP tip. (i, j) SEM images of the sTNP tip.
Chang et al. Nanoscale Research Letters 2013 8:519 doi:10.1186/1556-276X-8-519