Antireflective grassy surface on glass substrates with self-masked dry etching
1 School of Information and Mechatronics, Gwangju Institute of Science and Technology, 1 Oryong-dong, Buk-gu, Gwangju 500-712, Republic of Korea
2 Department of Electronic Engineering, Pusan National University, 2 Busandaehak-ro 63beong-gil, Geumjeong-gu, Busan 609-735, Republic of Korea
Nanoscale Research Letters 2013, 8:505 doi:10.1186/1556-276X-8-505Published: 1 December 2013
Although recently developed bio-inspired nanostructures exhibit superior optic performance, their practical applications are limited due to cost issues. We present highly transparent glasses with grassy surface fabricated with self-masked dry etch process. Simultaneously generated nanoclusters during reactive ion etch process with simple gas mixture (i.e., CF4/O2) enables lithography-free, one-step nanostructure fabrication. The resulting grassy surfaces, composed of tapered subwavelength structures, exhibit antireflective (AR) properties in 300 to 1,800-nm wavelength ranges as well as improved hydrophilicity for antifogging. Rigorous coupled-wave analysis calculation provides design guidelines for AR surface on glass substrates.