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Temperature dependence of electrical characteristics of Pt/GaN Schottky diode fabricated by UHV e-beam evaporation

Ashish Kumar1*, Shamsul Arafin2, Markus Christian Amann2 and Rajendra Singh1

Author Affiliations

1 Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016, India

2 Walter Schottky Institut, Technische Universität München, Garching 85748, Germany

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Nanoscale Research Letters 2013, 8:481  doi:10.1186/1556-276X-8-481

Published: 15 November 2013


Temperature-dependent electrical characterization of Pt/n-GaN Schottky barrier diodes prepared by ultra high vacuum evaporation has been done. Analysis has been made to determine the origin of the anomalous temperature dependence of the Schottky barrier height, the ideality factor, and the Richardson constant calculated from the I-V-T characteristics. Variable-temperature Hall effect measurements have been carried out to understand charge transport at low temperature. The modified activation energy plot from the barrier inhomogeneity model has given the value of 32.2 A/(cm2 K2) for the Richardson constant A** in the temperature range 200 to 380 K which is close to the known value of 26.4A/(cm2 K2) for n-type GaN.