Figure 5.

The influence of deposition time on the growth of NWs. Series of STM images (1,000 × 1,000 nm2) of the manganese silicide NWs and islands grown on the Si(110) surfaces at different durations. (a) 5, (b) 10, (c) 25, and (d) 50 min. The deposition rate and growth temperature were kept at approximately 0.2 ML min−1 and 550°C, respectively.

Zou et al. Nanoscale Research Letters 2013 8:45   doi:10.1186/1556-276X-8-45
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