Figure 2.

The length distribution of the manganese silicide NWs formed on the Si(110) surface at different growth temperatures. During deposition, the Mn deposition rate and coverage were kept at approximately 0.02 ML/min and 1 ML, respectively.

Zou et al. Nanoscale Research Letters 2013 8:45   doi:10.1186/1556-276X-8-45
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