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Fabrication of graphene films with high transparent conducting characteristics

Xiying Ma* and Hao Zhang

Author Affiliations

School of Mathematics and Physics, Suzhou University of Science and Technology, 1# Kerui Road, Suzhou, Jiangsu 215009, China

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Nanoscale Research Letters 2013, 8:440  doi:10.1186/1556-276X-8-440

Published: 23 October 2013


We present a study on the transparent conducting characteristics of graphene-based films prepared by means of rapid chemical vapor deposition. The graphene films were grown on quartz slides with a CH4/Ar mixed gas under a constant flow at 950°C and then annealed at 1,000°C. It was found that the graphene films present excellent electrical conductivity with high transparency. The conductivity is up to 1,240 S/cm, the sheet resistance is lower than 1 kΩ/sq, and the transparency is well over 85% in the visible wavelength range of 400 to 800 nm, showing that the graphene films have very low resistivity and superior transparency and completely satisfy the need for transparent conductors. These properties can be used in many applications, such as transparent conductor films for touch panels.


61.48.+c, 78.67.Pt, 68.37.Hk, 68.65.Ac

Graphene film; Transparent conducting characteristics; Sheet resistance; Transparency