FIB and TEM images of the TaNxfilm deposited on Si. (a) Cross section of the TaNx film deposited on Si obtained with FIB technique. (b) TEM image of amorphous and chain-like structures. (c) HRTEM image of 5-nm nanoparticles forming the chain-like structure. (d) Selected-area electron diffraction (SAED) pattern, where beside the diffused broad band characteristic for amorphous material, faint spots are present which could be indexed as cubic Fm-3m tantalum.
Spyropoulos-Antonakakis et al. Nanoscale Research Letters 2013 8:432 doi:10.1186/1556-276X-8-432