Figure 6.

TEM image of W/TiOx/TaOx/W structure. (a) Cross-sectional TEM image with a typical device size of 0.6 × 0.6 μm2. HRTEM images of (b) outside and (c) inside via-hole regions.

Prakash et al. Nanoscale Research Letters 2013 8:418   doi:10.1186/1556-276X-8-418
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