Figure 5.

TEM image of W/TaOx/W structure. (a) Cross-sectional TEM image with a device size of 0.15 × 0.15 μm2. (b) HRTEM image inside the via-hole region. The thickness of TaOx film is approximately 6.8 nm.

Prakash et al. Nanoscale Research Letters 2013 8:418   doi:10.1186/1556-276X-8-418
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