Figure 5.

SEM images of Si nanohole arrays fabricated by Ag-assisted chemical etching. SEM images of Si nanohole arrays fabricated by Ag-assisted chemical etching in 5 mol dm-3 HF - 1 mol dm-3 H2O2 solution for (a) 20 s, (b) 30 s, and (c) 1 min. (d) Silicon nanohole arrays formed in 10 mol dm-3 HF - 1 mol dm-3 H2O2 solution for 1 min. (a) top and (b-d) cross-sectional SEM images.

Asoh et al. Nanoscale Research Letters 2013 8:410   doi:10.1186/1556-276X-8-410
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