Figure 2.

Schematic diagrams for FIB processing to fabricate Hall measurement electrodes on a 521-nm-diameter bismuth nanowire. (a) Overall view of the fabricated sample. (b-g) Procedure for the fabrication of electrodes by FIB. (h-k) Cross-sectional view during electrode fabrication. (l) 3-D view of processing with the dual-beam FIB-SEM.

Murata and Hasegawa Nanoscale Research Letters 2013 8:400   doi:10.1186/1556-276X-8-400
Download authors' original image