Figure 2.

Cross-sectional FESEM views (a to d) of the 0.85-μm SiNWs after deposition of α-Si:H passivation layer. Using plasma power of 15 and 40 W for 10 and 30 min, respectively.

Li et al. Nanoscale Research Letters 2013 8:396   doi:10.1186/1556-276X-8-396
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