SEM image of the hole array pattern in master mold (hole depth approximately 1,000 nm). (a) Diameter 120 nm and array period 1,000 nm. (b) Diameter 300 nm and array period 1,000 nm. (c) Diameter 500 nm and array period 2,000 nm. (d) Cross-section near a large etched area, showing hole depth close to 1,000 nm. Samples were tilted 45° for SEM imaging.
Con and Cui Nanoscale Research Letters 2013 8:394 doi:10.1186/1556-276X-8-394