Figure 3.

Morphology and composition of an IrOx/AlOx/W cross-point structure. (a) OM image. (b) Cross-sectional TEM image of the cross-point memory device. The thickness of AlOx film is approximately 7 nm. (c) EDS obtained from TEM image (b).

Prakash et al. Nanoscale Research Letters 2013 8:379   doi:10.1186/1556-276X-8-379
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