Figure 2.

SEM images of ZnO nanostructures. They are grown on (a) bare Si substrate, the Si substrate coated with the seed layer deposited by (b) RF magnetron sputtering (40 nm in thickness) and (c) dip coating, at 0.05 M, at 95°C for 5 h (insets are corresponding cross-sectional images).

Dong et al. Nanoscale Research Letters 2013 8:378   doi:10.1186/1556-276X-8-378
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