Figure 1.

Schematic of the experimental procedure. To fabricate uniform SiGe/Si MQW (a) nanorod and (b) nanodot arrays from the Si0.4Ge0.6/Si MQWs using NSL combined with the RIE process.

Chang et al. Nanoscale Research Letters 2013 8:349   doi:10.1186/1556-276X-8-349
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