Figure 4.

FTIR spectra of a SiNxthin film. The films were deposited by the N2-reactive method recorded with a normal incidence and with an incidence angle of 65°. The inset shows the TO and LO band positions of SiNx layers deposited by the N2-reactive (full squares) and the co-sputtering (empty squares) methods as a function of the composition.

Debieu et al. Nanoscale Research Letters 2013 8:31   doi:10.1186/1556-276X-8-31
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