Resolution:
standard / ## Figure 2.
Evolution of the dispersion curves of SiN_{x}thin films. The films were produced by the N_{2}-reactive (full symbols) and the co-sputtering (empty symbols) methods as a function
of the Ar/N_{2} gas flow ratio and the Si/Si_{3}N_{4} target power ratio, respectively. The dispersion curve of Si_{3}N_{4} from [28] is shown for comparison.
Debieu |