Figure 1.

General schematic of the process steps used. (a) Porous alumina layer fabrication using electrochemistry. (b) Picture of a 2 × 2-cm2 sample, reference: centimetre scale. (c) Thermal nanoimprint lithography process used to pattern the surface of thin aluminium layers supported by silicon substrates, Al anodization and Si NW growth.

Gorisse et al. Nanoscale Research Letters 2013 8:287   doi:10.1186/1556-276X-8-287
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