Typical image of a nanopillar array fabricated in the experiments. (a) AFM image of nanopillar array fabricated with 532-nm CW laser and (b) its corresponding 3D image. (c) Roughness of coating along the dark line in (a). (d) Enlargement of one unit and (e) its cross section marked in (a).
Zhang et al. Nanoscale Research Letters 2013 8:280 doi:10.1186/1556-276X-8-280