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Absolute flatness measurements of silicon mirrors by a three-intersection method by near-infrared interferometry

Junichi Uchikoshi, Yoshinori Hayashi, Noritaka Ajari, Kentaro Kawai, Kenta Arima and Mizuho Morita*

Author Affiliations

Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan

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Nanoscale Research Letters 2013, 8:275  doi:10.1186/1556-276X-8-275

Published: 7 June 2013


Absolute flatness of three silicon plane mirrors have been measured by a three-intersection method based on the three-flat method using a near-infrared interferometer. The interferometer was constructed using a near-infrared laser diode with a 1,310-nm wavelength light where the silicon plane mirror is transparent. The height differences at the coordinate values between the absolute line profiles by the three-intersection method have been evaluated. The height differences of the three flats were 4.5 nm or less. The three-intersection method using the near-infrared interferometer was useful for measuring the absolute flatness of the silicon plane mirrors.

Absolute flatness; Silicon; Mirror; Interferometer; Near infrared; Phase shift; Three-flat method; Three-intersection method